rus
TS_pub
technospheramag
technospheramag
ТЕХНОСФЕРА_РИЦ
Technologies and Technology Equipment
A. V. Naumov, V. V. Startsev
Preparation of Some Bulk Photonics Crystals by the Melt Crystallization Methods in Russia. Part I DOI: 10.22184/1993-7296.FRos.2022.16.4.272.286
The paper presents an overview of the state-of-the-art methods for melt preparation of some bulk photonics crystals. The first part of the review analyzes the current situation in Russia for some industrially significant photonics crystals. The factors that are important for modern production, as well as the determinant factors for control of the composition, structure, morphology, and other properties of industrial optical materials, are indicated.
Preparation of Some Bulk Photonics Crystals by the Melt Crystallization Methods in Russia. Part I DOI: 10.22184/1993-7296.FRos.2022.16.4.272.286
The paper presents an overview of the state-of-the-art methods for melt preparation of some bulk photonics crystals. The first part of the review analyzes the current situation in Russia for some industrially significant photonics crystals. The factors that are important for modern production, as well as the determinant factors for control of the composition, structure, morphology, and other properties of industrial optical materials, are indicated.
Tags: crystal growth crystallization family czochralski and bridgman methods gaas single crystal выращивание кристаллов кристаллизация монокристалл семейство методов чохральского и бриджмена
S. V. Sidorova, K. M. Moiseev, D. D. Vasilev, M. V. Nazarenko, I. V. Mikhailova
Plasma Treatment of Material Surfaces for the Photonics Applications DOI: 10.22184/1993-7296.FRos.2022.16.4.288.295
Plasma treatment is a powerful tool for cleaning the material surface from contamination, reducing the surface roughness, increasing the surface energy and surface modification. The use of plasma processing systems in the process equipment chain is a global trend. The article presents the results of high-frequency gas discharge plasma processing in the MPC RF‑12 plasma treatment systems. The influence of plasma treatment parameters and modes, namely power and time, on the treatment quality, determined by the contact angle, is studied. It is shown that in some cases it is possible to obtain the similar results with different ratios of plasma treatment parameters.
Plasma Treatment of Material Surfaces for the Photonics Applications DOI: 10.22184/1993-7296.FRos.2022.16.4.288.295
Plasma treatment is a powerful tool for cleaning the material surface from contamination, reducing the surface roughness, increasing the surface energy and surface modification. The use of plasma processing systems in the process equipment chain is a global trend. The article presents the results of high-frequency gas discharge plasma processing in the MPC RF‑12 plasma treatment systems. The influence of plasma treatment parameters and modes, namely power and time, on the treatment quality, determined by the contact angle, is studied. It is shown that in some cases it is possible to obtain the similar results with different ratios of plasma treatment parameters.
Tags: cleaning of optical elements low-temperature pulsed plasma plasma surface treatment technology for manufacturing optical components низкотемпературная импульсная плазма очистка оптических элементов плазменная обработка поверхности технология изготовления оптических компонентов
Nanophotonics
A. A. Nikitin, K. O. Voropaev, A. A. Ershov, I. A. Ryabсev, A. V. Kondrashov, M. V. Parfenov, A. A. Semenov, A. V. Shamrai, E. I. Terukov, A. V. Petrov, A. B. Ustinov
Study of Silicon Nitride Film Deposition Technology for Application in the Photonic Integrated Circuits DOI: 10.22184/1993-7296.FRos.2022.16.4.296.304
The article is devoted to the production technology of optical micro-waveguides made of silicon nitride. The silicon substrates with a silicon oxide sublayer were used to produce the waveguide structures. The silicon nitride films were deposited on the silicon oxide surface by plasma-enhanced chemical vapor deposition and low-pressure chemical vapor deposition. The silicon nitride film thickness varied from 710 to 730 nm, depending on the chemical vapor deposition technology. Photolithography and reactive-ion etching were used to produce the waveguide structures. The waveguide structure width varied from 1 to 5 μm with a pitch of 500 nm. A cladding layer of silicon oxide was deposited on the structure surface. This paper describes the study of losses at a wavelength of 1.55 μm in the waveguide structures made by both chemical vapor deposition methods. A comparison of the deposition methods demonstrated that the developed method of plasma-enhanced chemical vapor deposition provided a significant reduction in the losses in structures compared to the low-pressure chemical vapor deposition.
Study of Silicon Nitride Film Deposition Technology for Application in the Photonic Integrated Circuits DOI: 10.22184/1993-7296.FRos.2022.16.4.296.304
The article is devoted to the production technology of optical micro-waveguides made of silicon nitride. The silicon substrates with a silicon oxide sublayer were used to produce the waveguide structures. The silicon nitride films were deposited on the silicon oxide surface by plasma-enhanced chemical vapor deposition and low-pressure chemical vapor deposition. The silicon nitride film thickness varied from 710 to 730 nm, depending on the chemical vapor deposition technology. Photolithography and reactive-ion etching were used to produce the waveguide structures. The waveguide structure width varied from 1 to 5 μm with a pitch of 500 nm. A cladding layer of silicon oxide was deposited on the structure surface. This paper describes the study of losses at a wavelength of 1.55 μm in the waveguide structures made by both chemical vapor deposition methods. A comparison of the deposition methods demonstrated that the developed method of plasma-enhanced chemical vapor deposition provided a significant reduction in the losses in structures compared to the low-pressure chemical vapor deposition.
Tags: lpcvd microwave photonics pecvd photonic integrated circuits silicon nitride нитрид кремния радиофотоника фотонные интегральные схемы
Optical Devices & Systems
A. P. Semenov, M. A. Abdulkadyrov, V. E. Patrikeev, A. B. Morozov, R. K. Nasyrov
Testing Methods for the Shape of Axial and Extra-Axial Aspherical Surfaces with a Computer-Generated Holograms, Decentering Determination and Distortion Consideration During its Formation. Part I DOI: 10.22184/1993-7296.FRos.2022.16.4.318.327
LZOS JSC has been using the diffractive optical elements (DOE) or computer-generated holograms (CGH) for many years to test the surfaces of large-sized optical mirrors for astronomical and space purposes. They are used for aspherical surface shape testing, control of the shape of extra-axial aspherical surfaces with registration of extra-axial mirror parameters and orientation, testing of the aspherical surface vertex position relative to the mirror geometric center, distortion consideration in the interferogram images, mutual adjustment of mirrors in the testing schemes, etc. Thus, the CGHs have become an integral part of the up-to-date testing of aspherical surfaces of the large-sized optical mirrors and optical systems.
Testing Methods for the Shape of Axial and Extra-Axial Aspherical Surfaces with a Computer-Generated Holograms, Decentering Determination and Distortion Consideration During its Formation. Part I DOI: 10.22184/1993-7296.FRos.2022.16.4.318.327
LZOS JSC has been using the diffractive optical elements (DOE) or computer-generated holograms (CGH) for many years to test the surfaces of large-sized optical mirrors for astronomical and space purposes. They are used for aspherical surface shape testing, control of the shape of extra-axial aspherical surfaces with registration of extra-axial mirror parameters and orientation, testing of the aspherical surface vertex position relative to the mirror geometric center, distortion consideration in the interferogram images, mutual adjustment of mirrors in the testing schemes, etc. Thus, the CGHs have become an integral part of the up-to-date testing of aspherical surfaces of the large-sized optical mirrors and optical systems.
Tags: distortion during formation large-sized optical systems synthesized diffraction gratings testing of aspherical surfaces дисторсия при формообразовании контроль асферических поверхностей крупногабаритные оптические системы синтезированные дифракционные решетки
Metatronics
I. V. Minin, O. V. Minin
Optical Super-Resonance in the Dielectric Mesoscale Spheres DOI: 10.22184/1993-7296.FRos.2022.16.4.306.317
The resonant scattering properties of a plane electromagnetic wave on a spherical dielectric particle with a dimensional parameter q of the order of 10 are briefly considered. Despite the long historical background, new solutions lead to the unexpected and sometimes unusual results demonstating a number of practically important properties, including high-order Fano resonance with generating of extremely high electromagnetic wave.
Optical Super-Resonance in the Dielectric Mesoscale Spheres DOI: 10.22184/1993-7296.FRos.2022.16.4.306.317
The resonant scattering properties of a plane electromagnetic wave on a spherical dielectric particle with a dimensional parameter q of the order of 10 are briefly considered. Despite the long historical background, new solutions lead to the unexpected and sometimes unusual results demonstating a number of practically important properties, including high-order Fano resonance with generating of extremely high electromagnetic wave.
Tags: fano resonance mesatronics metaphotonics surface nanostructuring мезатроника метафотоника наноструктурирование поверхностей резонанс фано
News
Materials & Coatings
I. A. Filatov, E. A. Davydova, N. N. Shchedrina, A. O. Peltek, V. M. Prokopiev, G. V. Odintsova
Laser Technologies Possibilities for Reducing Biofouling of Metals in the Aquatic Environment DOI: 10.22184/1993-7296.FRos.2022.16.4.328.338
The article presents the development of a laser structuring technology of the metals surface for protection against biofouling. This technology involves the processing of the material before placing it in the aquatic environment. Alloys of stainless steel and duralumin were used in the work. The effect of laser structuring on the contact angle and the interaction of laser-structured metal surfaces with microorganisms in water is considered. A positive trend in protection against colonization of microorganisms on the surface of metals after laser treatment was revealed.
Laser Technologies Possibilities for Reducing Biofouling of Metals in the Aquatic Environment DOI: 10.22184/1993-7296.FRos.2022.16.4.328.338
The article presents the development of a laser structuring technology of the metals surface for protection against biofouling. This technology involves the processing of the material before placing it in the aquatic environment. Alloys of stainless steel and duralumin were used in the work. The effect of laser structuring on the contact angle and the interaction of laser-structured metal surfaces with microorganisms in water is considered. A positive trend in protection against colonization of microorganisms on the surface of metals after laser treatment was revealed.